Pixelligent novel nano materials can extend the optical lithography

According Pixelligent Technologies LLC, said the company developed a claim to improve the resolution of existing lithography equipment, the nanocrystalline (nanocrystalline) materials, the optical lithography (Optical lithography) expandable to 32 nm or less.

The company recently concluded a $ 2,000,000 equity financing, the funds will be used to set the commercialization of nano-crystalline materials, the material alleged to be, and OPA4228UA datasheet and in optical lithography and OPA4228UA price and nano-micro composite coatings.

"We use nano-lithography using new materials technology development," Pixelligent founder and OPA4228UA suppliers and president Greg Cooper said. "The industry has played lithography technology to the limit, but we believe we can develop in the future with unique optical properties of new materials to prolong the life of lithography."

Pixelligent CEO, said Craig Bandes, except as photoresist nanocrystals, the company is currently being developed "to assist in cooling, the heat discharged chip" chip nanocomposite coating. Pixelligents Tips include customized for the specific purpose of production of amorphous silicon nanocrystals. The company declined to disclose its proprietary nanoparticle specific components, only reveal that they are amorphous silicon (nonsilicon).

Pixelligent said, through this half of the conductive polymer nano-crystal lithography combined with conventional photoresist can be improved, integrated circuit line width can be more detailed. The company also said its development through the use of nano-crystalline coating that can chip in the use of existing manufacturing equipment based on the increased revenue, lower material costs and improve productivity.

Since its inception in 2000, Pixelligent to participate in the National Science Foundation Small Business Innovation Research (SBIR) program and the National Institute of Standards and Technology Advanced Technology Program (ATP). The latter Pixelligent signed in 2007 worth 200 million contract, SBIR awards given Pixelligent 600,000 dollars, in addition to Pixelligent photoresist also obtained from commercial manufacturers Brewer Science, Honeywell Electronic Materials R & D support, and JSR Micro .

Signed with the NIST ATP contract, Pixelligent developed a class using a special light-sensitive bleaching (photobleachable) materials, semiconductor nanocrystals based on the reversible contrast enhancement layer (R-CEL), said to be in the ultra-high resolution wafer under the two imaging (double patterning). Today, the 193 nm - the wavelength of light can be measured reliably in the 65-nanometer process technology under the projection (image) circuit, but the ability to expand to 45 nm and below requires two imaging (using two separate exposures, the use of minor deviations mode).

Pixelligent said that through the use of reversible optical bleaching effect, R-CEL can achieve ultra-high resolution, twice the exposure to avoid mutual interference. R-CEL can be in a mode to selectively bleach to make the lithography light through, and then reversed to the opaque state once again in the second bleaching stage model.

Pixelligente with traditional suppliers sell to resist (photoresists), also plans to nanocrystalline materials specifically related to licensing the technology to lithography material suppliers.